ABM High-resolution Manual Mask Aligner System

Table-top mask aligner system
Precision alignment module for single-die/piece-parts up to 6” wafers/substrates. Option for up to 8” wafers/substrates
Interchangeable fixed-level or planarizing (wedge compensation) vacuum chucks with pre-alignment pins
Continuously adjustable hard/soft, vacuum contact and proximity printing
Micrometer driven 0.5 μm X, Y, and 0.0001 degree Theta chuck motion. Option for differential micrometers
Chuck Travel X/Y ±6 mm, Theta ±5°
Precision Z adjust chuck motion with pressure adjustable mechanical clutch (for setting substrate-to-mask pressure) with auto-planarization (for leveling of wafer to mask)
Interchangeable top or bottom-load 2” to maximum 7” size vacuum mask holders. Option for up to 9” size vacuum mask holder
Coarse mask rotation motion up to +/-45 degrees
Nitrogen purge between mask and substrate/wafer
6” round/square uniform collimated NUV (365-436 nm) exposure beam. Option for DUV (220-280 nm) and MUV (280-310 nm) wavelengths and for 8” round/square uniform collimated exposure beam
Precision heat removing quartz dielectric coated mirrors
Calibrated speed exhaust fan with thermocouple for over-temperature protection
Fly’s eye diffraction reducing antireflection (AR) coated optics
Full-field collimating lens with beam divergence half angle <1.85 degrees
Integrated dual wavelength intensity sensors and feedback circuits
Hg Arc lamp with UV leak proof enclosure
Temperature and air-flow sensors with safety cut-off
Arrangement for insertion and mounting of wavelength and neutral density filters
Manual/auto expose digital adjustable shutter timer from 0.1 to 999.9 seconds
Adjustable wattage 2-Channel 350 Watt NUV Constant Intensity/Constant Power controlling power supplies. Option for 500 Watt, 1000 Watt, and 2,000 Watt DUV and NUV power supplies
Audible Alarm for over-power and lamp protection
Single/Split-field Dual CCD Camera alignment systems with 90x – 600x video zoom magnification. Option for high 180x – 1200x magnification and for Single/Split-field Microscope alignment system


Mask Aligners:
A highly versatile high-resolution contact/proximity manual mask aligner and UV exposure system suitable for R&D, Pilot Production, and Manufacturing applications featuring a wide range of optional interchangeable and upgradeable modular sub-systems which include a choice of UV lightsources, UV operating spectrums, power supplies, mask and wafer/substrate holders, and viewing/alignment optics. Unexcelled in its long term reliability, versatility, and ease of use, the ABM Mask Aligner and Exposure System is a powerful photolithography tool that combines functionality and low cost of ownership.

Specifications

Table-top mask aligner system Precision alignment module for single-die/piece-parts up to 6” wafers/substrates. Option for up to 8” wafers/substrates Interchangeable fixed-level or planarizing (wedge compensation) vacuum chucks with pre-alignment pins Continuously adjustable hard/soft, vacuum contact and proximity printing Micrometer driven 0.5 μm X, Y, and 0.0001 degree Theta chuck motion. Option for differential micrometers Chuck Travel X/Y ±6 mm, Theta ±5° Precision Z adjust chuck motion with pressure adjustable mechanical clutch (for setting substrate-to-mask pressure) with auto-planarization (for leveling of wafer to mask) Interchangeable top or bottom-load 2” to maximum 7” size vacuum mask holders. Option for up to 9” size vacuum mask holder Coarse mask rotation motion up to +/-45 degrees Nitrogen purge between mask and substrate/wafer 6” round/square uniform collimated NUV (365-436 nm) exposure beam. Option for DUV (220-280 nm) and MUV (280-310 nm) wavelengths and for 8” round/square uniform collimated exposure beam Precision heat removing quartz dielectric coated mirrors Calibrated speed exhaust fan with thermocouple for over-temperature protection Fly’s eye diffraction reducing antireflection (AR) coated optics Full-field collimating lens with beam divergence half angle <1.85 degrees Integrated dual wavelength intensity sensors and feedback circuits Hg Arc lamp with UV leak proof enclosure Temperature and air-flow sensors with safety cut-off Arrangement for insertion and mounting of wavelength and neutral density filters Manual/auto expose digital adjustable shutter timer from 0.1 to 999.9 seconds Adjustable wattage 2-Channel 350 Watt NUV Constant Intensity/Constant Power controlling power supplies. Option for 500 Watt, 1000 Watt, and 2,000 Watt DUV and NUV power supplies Audible Alarm for over-power and lamp protection Single/Split-field Dual CCD Camera alignment systems with 90x – 600x video zoom magnification. Option for high 180x – 1200x magnification and for Single/Split-field Microscope alignment system	Microscope Memory Pre-alignment Function (for return of microscope to last set alignment position) Microscope mounting with pneumatic locking for X, Y motion and coarse/fine Z focus Electronic/pneumatic operator control panel and system. Option for semi-auto PLC with touch panel operation/control Fully safety interlocked and Emergency Shut-off system System Upgrade and Optional Items: Precision alignment module for up to maximum 8” wafers/substrates 8” round/square uniform collimated UV exposure beams for DUV (220-280 nm), MUV (280-310 nm), and NUV (365-450 nm) wavelengths Semi-auto PLC with touch panel operation/control Differential micrometers for fine 0.1 μm X, Y, and 0.00001 degree Theta chuck motion Joystick for motorized X, Y, Theta chuck motion Ring illumination (for BF/DF illumination) Prism blocks (for reducing minimum Split-field Dual CCD Camera separation) down to 10 mm High magnification up to 2000x Motorized zoom and focus (for zoom tubes with CCD Camera alignment systems) Backside Infrared (BSIR) alignment system Backside Visible (BSV) alignment system Large Gap Function (LGF) alignment system UV Nanoimprint Lithography (UV-NIL) module Wafer Clamping System for alignment and clamping of wafers for transfer to Wafer Bonder for final bonding G-, H-, I-Line wavelength filters Neutral Density (ND) filters Intensity meter with single/dual wavelength probes Standard support and vibration isolation tables Oil-free vacuum pumps and compressors Remote exhaust fan UV-400 protection goggles
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